Titan3 G2 60-300 TEM
The Titan3 includes a newly designed base to provide ultra stable support for a
column with both image and probe correctors and a monochromator. An
environmental enclosure effectively isolates the column from external interferences
and at the same time relaxes facility requirements and infrastructure costs. High
speed remote control removes even the operator from the instrument environment,
a change that will be welcomed by most operators. A larger pole piece gap,
permitted by the corrected optics, brings new flexibility to high resolution TEM
applications such as tomography, cryo TEM, environmental TEM and dynamic
experiments. Field upgrades that permit the addition of correctors or a
monochromator to an existing column provide budgetary flexibility as well.
Nova NanoSEM Scanning Electon Microscope
The FEI Nova NanoSEM line of SEMs provides high-quality nanoscale research
tools for a variety of applications that involve sample characterization, analysis,
nanoprototyping, and S/TEM sample preparation.
More samples, including the most non-conducting or contaminating materials,
can equally be characterized or analyzed in the Nova NanoSEM 50 series, using
its unique low vacuum capabilities. Characterization in low vacuum extends all
the way up to ultra-high resolution, thanks to FEI’s Helix? detector technology.
Small and large samples can easily be accommodated inside the large chamber,
on the Nova NanoSEM’s high precision, high stability stages.
In addition, a high definition camera and a correlative navigation unit help to find
and move to the right region of interest in no time. For nanoprototyping, the Nova
NanoSEM 50 series offers the most extensive set of integrated tools, including a
16-bit on-board digital pattern generator and dedicated patterning software, a high
speed electrostatic beam blanker and gas injection systems for direct electron
beam writing of nanostructures. The Nova NanoSEM 650’s stage is empowered
by piezo-motors for producing finer, higher XY repeatability over the full
150 x 150 mm range of movement.
Helios NanoLab 650 DualBeam
The outstanding imaging capabilities of the Helios NanoLab begin with its Elstar
FESEM. Thanks to its integrated monochromator (UC) and beam deceleration, it
delivers sub-nanometer resolution across the whole 1-30 kV range. The Elstar
features other unique technologies such as constant power lenses for higher
thermal stability and electrostatic scanning for higher deflection linearity and speed.
Its through-the-lens detector, set for highest collection efficiency of SE (secondary
electrons) and on-axis BSE (backscattered electrons), is complemented by FEI’s
latest advanced detection suite including three novel detectors: two multi-segment
solid state detectors for stunning low kV SE/BSE and S/TEM (scanning transmission
electron mode) performance, and a third dedicated to optimized FIB-SE and -SI
(secondary ion) imaging. It includes the following features:
· Best-in-class Elstar? monochromated Schottky FESEM technology and
performance, with subnanometer resolution from 1 to 30 kV
· FEI’s own versatile Tomahawk FIB, featuring excellent FIB imaging, outstanding
low kV operation down to 500 V and up to 65 nA beam current
· 150 x 150 mm high precision, high stability piezo stage
· Unique imaging technologies and solutions, including Helios generation II
detection and scanning strategies, process monitoring and endpointing
· Most complete and integrated suite of prototyping capabilities, with the integrated
16-bit pattern generator, advanced patterning features library and largest GIS
offering and expertise
· Best-in-class thin sample preparation and 3D characterization and analysis